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process-window

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Flowbudget / OpEnUV

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Physics-accurate EUV lithography simulator — LPP Sn-plasma source, CXRO materials, multilayer TMM optics, RCWA 1D/2D mask3D, Abbe/Hopkins aerial imaging with partial coherence, resist chain (Dill ABC, PEB, development, shot noise), process window (Bossung, DoF/EL), resist calibration from wafer data. Apache-2.0, 534 tests, 6 verified notebooks.

pytorch calibration optics physics-simulation plasma-physics lithography semiconductor fastapi photolithography euv computational-lithography resist-modeling mcp-server a2a-agent agent-friendly process-window euv-lithography hopkins-imaging dill-model multilayer-optics
  • Updated Aug 17, 2026
  • Jupyter Notebook

Akbar-0 / computational-lithography

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The project implements state-of-the-art computational lithography algorithms used in semiconductor manufacturing, complete with educational documentation and working examples!

inverse-imaging-problems inverse-lithography-technology optical-proximity-correction hopkins-imaging-model process-window depth-of-focus exposure-latitude normalized-image-log-slope resolution-enhancement-techniques bossung-curve
  • Updated Feb 5, 2026
  • Python

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