Physics-accurate EUV lithography simulator — LPP Sn-plasma source, CXRO materials, multilayer TMM optics, RCWA 1D/2D mask3D, Abbe/Hopkins aerial imaging with partial coherence, resist chain (Dill ABC, PEB, development, shot noise), process window (Bossung, DoF/EL), resist calibration from wafer data. Apache-2.0, 534 tests, 6 verified notebooks.
pytorch calibration optics physics-simulation plasma-physics lithography semiconductor fastapi photolithography euv computational-lithography resist-modeling mcp-server a2a-agent agent-friendly process-window euv-lithography hopkins-imaging dill-model multilayer-optics
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Updated
Aug 17, 2026 - Jupyter Notebook