[3/n] Add vLLM mask reuse capture - #2236
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Signed-off-by: Kai Xu <kaix@nvidia.com>
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Codecov Report❌ Patch coverage is Additional details and impacted files@@ Coverage Diff @@
## kaix/mask-reuse-01-offline-calibration #2236 +/- ##
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Coverage 79.00% 79.01%
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Files 527 530 +3
Lines 62652 63702 +1050
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+ Hits 49499 50333 +834
- Misses 13153 13369 +216
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What does this PR do?
Type of change: new feature
Adds the second mask-reuse sub-PR: vLLM V1 dense-reference capture, FA4 source witnessing, provenance validation, rank merging, and the sparse-attention calibration hook needed to collect compact mask-reuse evidence. It does not add topology selection.
This PR is stacked on #2235.
Usage
Testing
python -m pytest -qon the five source-manifest, capture, CLI, sparse-calibration, and vLLM-worker test modules: 55 passed.pre-commit run --files ...: passed.Before your PR is "Ready for review"
Make sure you read and follow Contributor guidelines and your commits are signed (
git commit -s -S).Make sure you read and follow the Security Best Practices (e.g. avoiding hardcoded
trust_remote_code=True,torch.load(..., weights_only=False),pickle, etc.).CONTRIBUTING.md: N/A — no copied code or new dependency.Additional Information
Stack 2 of 3. Base PR: #2235. The capture format binds the exact checkpoint, vanilla fit, FA4 source, geometry, prompt identity, and tensor-parallel evidence.